Sign In to View Organizational & Contract Pricing.
Select a Size
About This Item
Empirical Formula (Hill Notation):
C10H10ClNO4
Molecular Weight:
243.64
UNSPSC Code:
12352200
NACRES:
NA.03
PubChem Substance ID:
MDL number:
Beilstein/REAXYS Number:
7642748
SMILES string
CC(COC(Cl)=O)c1ccccc1[N+]([O-])=O
InChI key
LRWLGGPRIFYAPO-UHFFFAOYSA-N
InChI
1S/C10H10ClNO4/c1-7(6-16-10(11)13)8-4-2-3-5-9(8)12(14)15/h2-5,7H,6H2,1H3
assay
~95% chlorine basis
storage temp.
−20°C
Other Notes
Reagent for the introduction of the photolabile NPPOC protective group
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 3 Oral - Skin Corr. 1B
Storage Class
6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
M Beier et al.
Nucleic acids research, 28(4), E11-E11 (2000-01-29)
For DNA chip analyses, oligonucleotide quality has immense consequences for accuracy, sensitivity and dynamic range. The quality of chips produced by photolithographic in situ synthesis depends critically on the efficiency of photo-deprotection. By means of base-assisted enhancement of this process
W. Pfleiderer et al.
Tetrahedron Letters, 53, 4247-4247 (1997)
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service
