Skip to Content
Merck
CN
  • Formation and frequency response of two-dimensional nanowire lattices in an applied electric field.

Formation and frequency response of two-dimensional nanowire lattices in an applied electric field.

Langmuir : the ACS journal of surfaces and colloids (2015-05-16)
Sarah J Boehm, Lan Lin, Kimberly Guzmán Betancourt, Robyn Emery, Jeffrey S Mayer, Theresa S Mayer, Christine D Keating
ABSTRACT

Ordered two-dimensional (2D) lattices were formed by assembling silica-coated solid and segmented Au nanowires between coplanar electrodes using alternating current (ac) electric fields. Dielectrophoretic forces from the ac field concentrated wires between the electrodes, with their long axis aligned parallel to the field lines. After reaching a sufficient particle density, field-induced dipolar interactions resulted in the assembly of dense 2D lattices that spanned the electrodes, a distance of at least ten wire lengths. The ends of neighboring Au wires or segments overlapped a fraction of their length to form lattice structures with a "running bond" brickwork-like pattern. The observed lattice structures were tunable in three distinct ways: (1) particle segmentation pattern, which fixed the lattice periodicity for a given field condition; (2) ac frequency, which varied lattice periodicity in real time; and (3) switching the field on/off, which converted between lattice and smectic particle organizations. Electric field simulations were performed to understand how the observed lattice periodicity depends on the assembly conditions and particle segmentation. Directed self-assembly of well-ordered 2D metallic nanowire lattices that can be designed by Au striping pattern and reconfigured by changes in field conditions could enable new types of switchable optical or electronic devices.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Aluminum oxide, mesoporous, MSU-X (wormhole), average pore size 3.8 nm
Sigma-Aldrich
Tetraethyl orthosilicate, 99.999% trace metals basis
Sigma-Aldrich
Tetraethyl orthosilicate, reagent grade, 98%
Sigma-Aldrich
Tetraethyl orthosilicate, ≥99.0% (GC)
Sigma-Aldrich
Tetraethyl orthosilicate, packaged for use in deposition systems
Sigma-Aldrich
Aluminum oxide, nanopowder, 13 nm primary particle size (TEM), 99.8% trace metals basis
Sigma-Aldrich
Aluminum oxide, nanopowder, <50 nm particle size (TEM)
Sigma-Aldrich
Aluminum oxide, nanoparticles, <50 nm particle size (DLS), 20 wt. % in isopropanol
Sigma-Aldrich
Aluminum oxide, nanowires, diam. × L 2-6 nm × 200-400 nm
Sigma-Aldrich
Aluminum oxide, 99.997% trace metals basis
Sigma-Aldrich
Aluminum oxide, nanoparticles, 30-60 nm particle size (TEM), 20 wt. % in H2O
Sigma-Aldrich
Aluminum oxide, single crystal substrate, <0001>