Merck
CN
  • Thermally assisted methylation and subsequent silylation of scheduled acids of chemical weapon convention for on-site analysis and its comparison with the other methods of methylation.

Thermally assisted methylation and subsequent silylation of scheduled acids of chemical weapon convention for on-site analysis and its comparison with the other methods of methylation.

Journal of chromatography. A (2011-01-11)
Kanchanavadee Amphaisri, Meehir Palit, Gary Mallard
摘要

On-site verification of the chemical weapon convention (CWC) requires provision for the detection and identification of alkyl phosphonic acids as well as some organic acids that are amenable to GC-MS only after derivatisation. Various derivatisation methods have been used for the identification of these acids and for many cases the methyl derivatives are less prone to artifacts possibly leading to false positive identification. Methylation with diazomethane is widely used but, especially for on-site analysis it has limitation due to the potential explosive and health hazards. Other methylation procedures like trimethylsilyldiazomethane (TMSD), thermally assisted methylation (TAM) by trimethylphenylammonium hydroxide (TMPAH) and trimethylsulfonium hydroxide (TMSH) are evaluated. Data for methylation for the alkyl alkylphosphonic acids, alkylphosphonic acids and benzilic acid are reported. In addition, TAM followed by the silylation in the same sample without any additional sample preparation is also reported. Several parameters such as solvent, temperature, amount of reagents, time, etc. were studied. The two commercially available reagents namely, TMPAH and TMSH for TAM and subsequent silylation were evaluated. The LOD with TMPAH was below 0.5 ng per injection since all of the acids were detected by GC-MS with the S/N of >3 in full scan mode by AMDIS and their inter day relative standard deviation was from 4.7% to 10.8%.

材料
货号
品牌
产品描述

Sigma-Aldrich
苯基三甲基三溴化铵, 97%
Supelco
三甲基苯基氢氧化铵 溶液, ~0.5 M (CH3)3N(OH)C6H5 in methanol, for GC derivatization, LiChropur
Sigma-Aldrich
苯基三甲基氯化铵, ≥98%
Sigma-Aldrich
三甲基苯基氢氧化铵 溶液, ~25% in H2O (1.68 M)
Sigma-Aldrich
苯基三甲基溴化铵, 98%