In recent years considerable interest in ALD has emerged, mainly due to its ability to controllably coat even very small structures, e.g. nanoor microstructures.
Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.
Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.