Quality Level
Assay
≥99.99%
form
low-melting solid
reaction suitability
core: hafnium
mp
26-29 °C (lit.)
density
1.098 g/mL at 25 °C
SMILES string
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI key
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
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Related Categories
General description
Application
- As an atomic layer deposition(ALD) precursor for deposition of hafnium oxide thin films for advanced semiconductor devices.
- As a precursor to fabricate polymer-derived ceramic nanocomposites.
- To prepare HfO2, CeO2, and Ce-doped HfO2 thin films on Ge substrates by using tris(isopropyl-cyclopentadienyl)cerium [Ce(iPrCp)3] precursors with H2O via ALD method.
- To produce Hf3N4 thin films with TDMAH and ammonia at low substrate temperatures at 150−250 °C.
Analysis Note
accessory
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
Supplementary Hazards
Storage Class Code
4.3 - Hazardous materials, which set free flammable gases upon contact with water
WGK
WGK 3
Personal Protective Equipment
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