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Merck
CN

469858

Tetrakis(dimethylamido)titanium(IV)

99.999% trace metals basis

Synonym(s):

TDMAT, Tetrakis(dimethylamino)titanium(IV)

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About This Item

Linear Formula:
[(CH3)2N]4Ti
CAS Number:
3275-24-9
Molecular Weight:
224.17
EC Number:
221-904-3
MDL number:
MFCD00014861
UNSPSC Code:
12352103
PubChem Substance ID:
24870618
NACRES:
NA.23

Key Documents

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Quality Level

200

Assay

99.999% trace metals basis

form

liquid

reaction suitability

core: titanium

bp

50 °C/0.5 mmHg (lit.)

density

0.947 g/mL at 25 °C (lit.)

SMILES string

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

MNWRORMXBIWXCI-UHFFFAOYSA-N

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General description

Tetrakis(dimethylamido)titanium(IV) [Ti(N(CH₃)₂)₄], or TDMAT, is a volatile, colourless to pale yellow liquid. Its high volatility and thermal stability make it suitable for chemical vapor deposition (CVD) and atomic layer deposition (ALD), enabling the controlled deposition of titanium-based films such as titanium nitride (TiN) and titanium dioxide (TiO₂). It also supports uniform film growth at low temperatures, making it compatible with temperature-sensitive substrates

Application

Tetrakis(dimethylamido)titanium(IV) (TDMAT) is a precursor to titanium nitride (TiN) thin films by organometallic chemical vapor deposition (OMCVD)and titanium dioxide thin films by atomic layer deposition (ALD).TDMAT undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

Features and Benefits

  • 99.999% trace metals basis ensures superior quality of deposited films, with minimal defects and consistent properties, critical for microelectronics and optoelectronics applications.
  • High purity reduces the risk of contamination during the coating process, leading to enhanced adhesion, durability, and performance of the final products.
  • The absence of impurities allows for the precise control of particle size and morphology, improving the effectiveness of nanoparticles in targeted applications.
  • High purity ensures that electronic properties are not compromised by impurities, enhancing device performance and reliability.
  • Controlling heavy metals at ppb levels ensures effective contamination control, regulatory compliance, and optimized performance.

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H225,H260,H314

Hazard Classifications

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

Supplementary Hazards

EUH014

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

-22.0 °F - closed cup

Flash Point(C)

-30 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

危险化学品
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Certificates of Analysis (COA)

Lot/Batch Number
SHBT1500
SHBS9659
SHBS2053
SHBP1947
SHBL6315

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Improving performance via blocking layers in dye-sensitized solar cells based on nanowire photoanodes.
Li L, et al.
ACS Applied Materials & Interfaces, 7(23), 12824-12831 (2015)
Tianshuo Zhao et al.
Proceedings of the National Academy of Sciences of the United States of America, 118(7) (2021-02-10)
Semiconductors of narrow bandgaps and high quantum efficiency have not been broadly utilized for photocatalytic coevolution of H2 and O2 via water splitting. One prominent issue is to develop effective protection strategies, which not only mitigate photocorrosion in an aqueous
Young modulus and Poisson ratio measurements of TiO 2 thin films deposited with atomic layer deposition.
Borgese L, et al.
Surface and Coatings Technology, 206(8), 2459-2463 (2012)
Microstructure and elastic properties of atomic layer deposited TiO 2 anatase thin films.
Borgese L, et al.
Acta Materialia, 59(7), 2891-2900 (2011)
Yu Zhou et al.
Small (Weinheim an der Bergstrasse, Germany), 15(19), e1900078-e1900078 (2019-04-09)
Using the MoS2 -WTe2 heterostructure as a model system combined with electrochemical microreactors and density function theory calculations, it is shown that heterostructured contacts enhance the hydrogen evolution reaction (HER) activity of monolayer MoS2 . Two possible mechanisms are suggested
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