553123
Tetrakis(ethylmethylamido)hafnium(IV)
≥99.99% trace metals basis
Synonym(s):
TEMAH, Tetrakis(ethylmethylamino)hafnium(IV)
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About This Item
Quality Level
assay
≥99.99% trace metals basis
reaction suitability
core: hafnium
impurities
Purity excludes ~2000 ppm Zirconium
bp
78 °C/0.01 mmHg (lit.)
mp
<-50 °C
density
1.324 g/mL at 25 °C (lit.)
SMILES string
CCN(C)[Hf](N(C)CC)(N(C)CC)N(C)CC
InChI
1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
InChI key
NPEOKFBCHNGLJD-UHFFFAOYSA-N
General description
Application
TEMAH is ideal for ALD because of its low boiling point and its reactivity with water and ozone. Most importantly, its adsorption is self-limiting on a number of substrates including glass, indium-tin oxide(ITO), and Si(100). Researchers have also used it to deposit thin films ofHfO2 on 2D materials, like MoS2.
TEMAH is also useful precursor in the synthesis of ferroelectric hafnium zirconium oxide and Hf1-xZrxO2 thin films on MoS2 phototransistors. Researchers have also deposited thin films of hafnium nitride (Hf3N4) by ALD alternatively pulsing TEMAH and ammonia.
Features and Benefits
- Thermally stable.
- It has sufficient volatility and is suitable for use in vapor deposition.
- Completely self-limiting surface reactions.
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Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - STOT SE 3 - Water-react. 1
target_organs
Respiratory system
supp_hazards
Storage Class
4.3 - Hazardous materials which set free flammable gases upon contact with water
wgk
WGK 3
flash_point_f
51.8 °F - closed cup
flash_point_c
11 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
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Articles
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 553123-5ML | 04061838147691 |
| 553123-25ML | 04061838147684 |