Search Within
Content Type
Applications
Chemical vapor deposition
Applied Filters:
facet applications:Chemical vapor deposition
Showing 1-10 of 14 results
化学气相沉积
化学气相沉积(CVD)基于气相化学工艺，将各种材料的薄膜层沉积到基材上。
Atomic Layer Deposition (ALD)
Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
Group 11 Thin Films by Atomic Layer Deposition
Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
High Purity Metalorganic Precursors for CPV Device Fabrication
High Purity Metalorganic Precursors for CPV Device Fabrication
Metal-Organic Complexes for Doping
Highly reducing or oxidizing species enhance organic semiconductor conductivity by reducing charge-carrier injection barriers.
Molybdenum Disulfide: Hydrogen Evolution
Catalytic water splitting produces hydrogen crucial for renewable energy, petroleum refining, and chemical industry applications like methanol production.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Savannah ALD System for Atomic Layer Deposition
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Page 1 of 2