蒸汽密度
1 (vs air)
质量水平
方案
98%
表单
solid
沸点
134 °C (lit.)
mp
50-64 °C (lit.)
SMILES字符串
C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1
InChI
1S/C6H18O3Si3/c1-10(2)7-11(3,4)9-12(5,6)8-10/h1-6H3
InChI key
HTDJPCNNEPUOOQ-UHFFFAOYSA-N
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应用
六甲基环三硅氧烷(D3)可用于合成:
- 通过阴离子开环聚合合成聚硅氧烷。
- 通过脉冲等离子体增强化学气相沉积(PECVD)合成绝缘生物材料用薄膜。
- 使用碱金属氢氧化物催化剂通过碳酸二甲酯的解聚反应合成二甲氧基二甲基硅烷
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Robust block copolymer mask for nanopatterning polymer films.
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The decomposition of hexamethylcyclotrisiloxane (HMCTS) has been studied at room temperature and in the range 473-673 K over the surface of basic (CaO, MgO) and acidic oxides (Al(2)O(3), SiO(2)). Alumina allows the complete removal of HMCTS from synthetic biogases at
Synthesis of branched polysiloxanes with controlled branching and functionalization by anionic ring-opening polymerization.
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Macromolecules, 36(11), 3890-3897 (2003)
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