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Merck
CN

W351407

1,8-辛二硫醇

≥97%, FG

别名:

1,8-二巯基辛烷

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关于此项目

线性分子式:
HS(CH2)8SH
化学文摘社编号:
分子量:
178.36
FEMA Number:
3514
Council of Europe no.:
2331
UNSPSC Code:
12164502
PubChem Substance ID:
Flavis number:
12.034
EC Number:
214-738-8
NACRES:
NA.21
MDL number:
Organoleptic:
meaty; sulfurous
Grade:
FG, Kosher
Biological source:
synthetic
Food allergen:
no known allergens
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SMILES string

SCCCCCCCCS

InChI

1S/C8H18S2/c9-7-5-3-1-2-4-6-8-10/h9-10H,1-8H2

InChI key

PGTWZHXOSWQKCY-UHFFFAOYSA-N

biological source

synthetic

grade

FG, Kosher

reg. compliance

EU Regulation 1334/2008 & 872/2012

assay

≥97%

refractive index

n20/D 1.505 (lit.)

bp

269-270 °C (lit.)

density

0.97 g/mL at 25 °C (lit.)

application(s)

flavors and fragrances

documentation

see Safety & Documentation for available documents

food allergen

no known allergens

organoleptic

meaty; sulfurous

Quality Level

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General description

1,8-Octanedithiol is a volatile sulfur-containing flavoring agent with a meaty, sulfurous odor.

pictograms

Exclamation mark

signalword

Warning

hcodes

Hazard Classifications

Acute Tox. 4 Oral

存储类别

10 - Combustible liquids

wgk

WGK 3

flash_point_f

235.4 °F - closed cup

flash_point_c

113 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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Fenaroli's Handbook of Flavor Ingredients, 1523-1523 (2016)
The role of sulfur compounds in food flavor part III: Thiols.
Maga JA & Katz I.
Critical Reviews in Food Science and Nutrition, 7(2), 147-192 (1976)
Nidhi Shah et al.
ACS nano, 9(10), 10278-10286 (2015-09-08)
Here we describe the electrodeposition of Ag in the presence of cetyltrimethylammonium bromide (CTAB) onto 5 μm gap Au interdigitated array (IDA) electrodes that are bare, thiol-functionalized, or thiol-functionalized and seeded with 4 nm diameter Au nanoparticles (NPs). After deposition
Jin Yeong Na et al.
Scientific reports, 5, 13288-13288 (2015-08-25)
Spin-coating has been used extensively in the fabrication of electronic devices; however, the effects of the processing parameters have not been fully explored. Here, we systematically characterize the effects of the spin-coating time on the microstructure evolution during semiconducting polymer

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