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关于此项目
线性分子式:
CH3C6H4SO3H · H2O
化学文摘社编号:
分子量:
190.22
EC Number:
203-180-0
UNSPSC Code:
12352002
PubChem Substance ID:
Beilstein/REAXYS Number:
3568023
MDL number:
Assay:
≥99.0%
Form:
solid
Grade:
SAJ special grade
grade
SAJ special grade
vapor density
5.9 (vs air)
assay
≥99.0%
form
solid
availability
available only in Japan
mp
103-106 °C (lit.)
SMILES string
[H]O[H].Cc1ccc(cc1)S(O)(=O)=O
InChI
1S/C7H8O3S.H2O/c1-6-2-4-7(5-3-6)11(8,9)10;/h2-5H,1H3,(H,8,9,10);1H2
InChI key
KJIFKLIQANRMOU-UHFFFAOYSA-N
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target_organs
Respiratory system
存储类别
8A - Combustible corrosive hazardous materials
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
dust mask type N95 (US), Eyeshields, Faceshields, Gloves
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1C - STOT SE 3
法规信息
新产品
此项目有
Ljupčo Pejov et al.
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 79(1), 27-34 (2011-03-23)
The 1:1 p-toluenesulfonic acid-water complex, p-toluenesulfonic acid itself and the p-toluenesulfonate anion were studied at HF and B3LYP/6-31+G(d,p) levels of theory. Full geometry optimizations of the aforementioned species reveal non-existence of ionic minima on the explored 1:1 p-toluenesulfonic acid-water complex
Abdullah S Al-Bogami et al.
Ultrasonics sonochemistry, 20(5), 1194-1202 (2013-04-18)
The present paper deal with the multi-component condensation of 8-hydroxy quinoline, aromatic aldehydes, and sulfone derivatives catalyzed by p-toluenesulfonic acid for the synthesis of a series of 4H-pyrano[3,2-h]quinoline derivatives in ethanol under ultrasonic irradiations. We provide a series of quinoline
Chika Taniguchi et al.
International journal of pharmaceutics, 434(1-2), 148-154 (2012-05-31)
This study was undertaken to develop new dipyridamole (DP) formulations with acidic microenvironmental pH-modifiers for improving dissolution and absorption under hypochlorhydric conditions. Dipyridamole granules (DPG) with ten acidic pH-modifiers were prepared with conventional wet granulation, and their manufacturability, stability and

