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  • Enhancement of ferroelectric polarization stability by interface engineering.

Enhancement of ferroelectric polarization stability by interface engineering.

Advanced materials (Deerfield Beach, Fla.) (2012-01-27)
H Lu, X Liu, J D Burton, C-W Bark, Y Wang, Y Zhang, D J Kim, A Stamm, P Lukashev, D A Felker, C M Folkman, P Gao, M S Rzchowski, X Q Pan, C-B Eom, E Y Tsymbal, A Gruverman
摘要

By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.

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Sigma-Aldrich
氧化钌(IV), 99.9% trace metals basis
Sigma-Aldrich
氧化钡, 99.99% trace metals basis
Sigma-Aldrich
氧化钡, 97%
Sigma-Aldrich
氧化钌(IV) 水合物, powder
Sigma-Aldrich
氧化钌(IV) 水合物, 99.9% trace metals basis