668729ALDRICH

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近十年来出现了原子层沉积（ALD）技术以满足各种需求，包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。

Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers

Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.

Dye-Sensitized and Perovskite Solar Cells: Interface Engineering by Atomic Layer Deposition

Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.

Nanowire Synthesis: From Top-Down to Bottom-Up

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

Atomic Layer Deposition of Nanomaterials for Li-Ion Batteries, Fuel Cells, and Solar Cells

Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.