266760
铪
sponge, +20 mesh, 99.5% trace metals basis (purity excludes ~2% zirconium)
别名:
Celtium, Hafnium element
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关于此项目
经验公式（希尔记法）:
Hf
化学文摘社编号:
分子量:
178.49
UNSPSC Code:
12352300
PubChem Substance ID:
EC Number:
231-166-4
MDL number:
assay
99.5% trace metals basis (purity excludes ~2% zirconium)
form
sponge
resistivity
29.6 μΩ-cm, 0°C
particle size
+20 mesh
bp
4602 °C (lit.)
mp
2227 °C (lit.)
density
13.3 g/cm3 (lit.)
SMILES string
[Hf]
InChI
1S/Hf
InChI key
VBJZVLUMGGDVMO-UHFFFAOYSA-N
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存储类别
13 - Non Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
法规信息
新产品
此项目有
Yu Gong et al.
Dalton transactions (Cambridge, England : 2003), 41(38), 11706-11715 (2012-08-18)
The isolated group 4 metal oxydifluoride molecules OMF(2) (M = Ti, Zr, Hf) with terminal oxo groups are produced specifically on the spontaneous reactions of metal atoms with OF(2) through annealing in solid argon. The product structures and vibrational spectra
Christopher C Underwood et al.
Inorganic chemistry, 52(1), 237-244 (2012-12-19)
This paper describes the hydrothermal chemistry of alkali hafnium fluorides, including the synthesis and structural characterization of five new alkali hafnium fluorides. Two ternary alkali hafnium fluorides are described: Li(2)HfF(6) in space group P31m with a = 4.9748(7) Å and
Byung-Hak Moon et al.
Journal of nanoscience and nanotechnology, 11(8), 7428-7432 (2011-11-23)
In this study, we investigated the electrochemical oxide nanotube formation on the Ti-35Ta-xHf alloys for dental materials. The Ti-35Ta-xHf alloys contained from 3 wt.% to 15 wt.% Hf were manufactured by arc melting furnace. The nanotube oxide layers were formed
Zhichao Liu et al.
Optics express, 20(2), 854-863 (2012-01-26)
Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD
Andreas Sauer et al.
Inorganic chemistry, 51(10), 5764-5770 (2012-05-11)
A series of group 4 metal complexes Zr-(1)(2), Zr-(2)(2), Zr-(3)(2), Zr-(4)(2), Zr-(5)(2), Hf-(1)(2), and Hf-(4)(2) containing two bridged bis(phenolate) ligands of the (OSSO)-type were prepared by the reaction of the corresponding bis(phenol) and group 4 metal precursor MX(4) (X =
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