274208
二氯二乙基硅烷
97%
别名:
Diethyldichlorosilane, Diethyldichlorosilicon
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关于此项目
线性分子式:
(C2H5)2SiCl2
化学文摘社编号:
分子量:
157.11
UNSPSC Code:
12352001
NACRES:
NA.22
PubChem Substance ID:
EC Number:
217-005-0
Beilstein/REAXYS Number:
605313
MDL number:
产品名称
二氯二乙基硅烷, 97%
InChI key
BYLOHCRAPOSXLY-UHFFFAOYSA-N
InChI
1S/C4H10Cl2Si/c1-3-7(5,6)4-2/h3-4H2,1-2H3
SMILES string
CC[Si](Cl)(Cl)CC
assay
97%
form
liquid
refractive index
n20/D 1.43 (lit.)
bp
125-131 °C (lit.)
density
1.05 g/mL at 25 °C (lit.)
storage temp.
2-8°C
Quality Level
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signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT SE 3
target_organs
Respiratory system
supp_hazards
存储类别
3 - Flammable liquids
wgk
WGK 1
flash_point_f
79.0 °F
flash_point_c
26.1 °C
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
危险化学品
此项目有
Peter Bieling et al.
The EMBO journal, 37(1), 102-121 (2017-11-17)
WASP-family proteins are known to promote assembly of branched actin networks by stimulating the filament-nucleating activity of the Arp2/3 complex. Here, we show that WASP-family proteins also function as polymerases that accelerate elongation of uncapped actin filaments. When clustered on
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
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