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线性分子式:
(CH3)2NLi
化学文摘社编号:
分子量:
51.02
UNSPSC Code:
12352111
NACRES:
NA.22
PubChem Substance ID:
EC Number:
222-714-3
Beilstein/REAXYS Number:
3618233
MDL number:
产品名称
二甲基胺锂, 95%
InChI key
YDGSUPBDGKOGQT-UHFFFAOYSA-N
InChI
1S/C2H6N.Li/c1-3-2;/h1-2H3;/q-1;+1
SMILES string
[Li]N(C)C
assay
95%
form
solid
functional group
amine
Quality Level
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Application
二甲基酰胺锂用作合成硼氮杂环 和 2,2′?二硼基联苯。它是用于二(亚氨基)吡啶二氯亚铁脱甲基合成酰胺酸亚铁配合物的脱保护试剂。
signalword
Danger
hcodes
Hazard Classifications
Pyr. Sol. 1 - Skin Corr. 1B - Water-react 2
存储类别
4.2 - Pyrophoric and self-heating hazardous materials
wgk
WGK 3
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
法规信息
新产品
此项目有
Bis (imino) pyridine ligand deprotonation promoted by a transient iron amide.
Bouwkamp MW, et al.
Inorganic Chemistry, 45(1), 2-4 (2006)
2, 2′-Diborabiphenyl: A Lewis Acid Analogue of 2, 2′-Bipyridine.
Emslie DJH, et al.
Angewandte Chemie (International Edition in English), 115(11), 1290-1293 (2003)
Richard O'Donoghue et al.
Dalton transactions (Cambridge, England : 2003), 46(47), 16551-16561 (2017-11-22)
Herein we describe an efficient low temperature (60-160 °C) plasma enhanced atomic layer deposition (PEALD) process for gallium oxide (Ga
Triphenylene analogues with B2N2C2 cores: synthesis, structure, redox behavior, and photophysical properties.
Jaska CA, et al.
Journal of the American Chemical Society, 128(33), 10885-10896 (2006)
Lukas Mai et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 25(31), 7489-7500 (2019-03-15)
New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to the pyrophoric trimethylaluminium (TMA) which is to date a widely used Al precursor. Combining the high reactivity of aluminium alkyls employing the
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