38385
二氯二异丙基硅烷
≥97.0% (GC)
别名:
二异丙基二氯硅烷
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关于此项目
经验公式（希尔记法）:
C6H14Cl2Si
化学文摘社编号:
分子量:
185.17
UNSPSC Code:
12352001
NACRES:
NA.22
PubChem Substance ID:
MDL number:
Beilstein/REAXYS Number:
1736244
Assay:
≥97.0% (GC)
Form:
liquid
InChI
1S/C6H14Cl2Si/c1-5(2)9(7,8)6(3)4/h5-6H,1-4H3
SMILES string
CC(C)[Si](Cl)(Cl)C(C)C
InChI key
GSENNYNYEKCQGA-UHFFFAOYSA-N
assay
≥97.0% (GC)
form
liquid
refractive index
n20/D 1.444
bp
66 °C/27 mmHg (lit.)
density
1.026 g/mL at 20 °C (lit.)
Quality Level
Other Notes
基团保护试剂；引入的两个醇与"系链技术"密切相关
signalword
Danger
hcodes
Hazard Classifications
Flam. Liq. 3 - Skin Corr. 1B
存储类别
3 - Flammable liquids
wgk
WGK 3
flash_point_f
109.4 °F - closed cup
flash_point_c
43 °C - closed cup
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
新产品
此项目有
J.H. Hutchinson et al.
Tetrahedron Letters, 32, 573-573 (1991)
C.L. Bradford et al.
Tetrahedron Letters, 36, 4189-4189 (1995)
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
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