Quality Segment
grade
electronic grade
assay
≥99.99%
form
liquid
reaction suitability
core: silicon
impurities
<0.5 ppm Carbon monoxide (CO), <1 ppm Argon + oxygen (Ar + O2), <1 ppm Carbon dioxide (CO2), <10 ppm Methane (CH4), <3 ppm Nitrogen (N2), <50 ppm Hydrogen fluoride (HF)
bp
−86 °C (lit.)
mp
−90 °C (lit.)
transition temp
critical temperature −14.2 °C
density
3.57 g/mL at 25 °C (lit.)
SMILES string
F[Si](F)(F)F
InChI
1S/F4Si/c1-5(2,3)4
InChI key
ABTOQLMXBSRXSM-UHFFFAOYSA-N
Application
四氟化硅被用于离子注入工艺，并通过等离子体辅助CVD作为氟化二氧化硅的前体。SiF4-SiH4-H2的混合物最近已被用于通过远程等离子体化学气相沉积（RPCVD）沉积多晶硅薄膜。这种氟化薄膜在室温下表现出可见光致发光（PL）。
Packaging
储存于碳钢气阀瓶中，带CGA180M/CGA110F针阀。
适用：
适用：
- Aldrich®气阀瓶站系统
- Aldrich®气阀瓶气体调节器
Other Notes
参见技术信息手册AL-151 气体调节器：选型、安装和操作
Legal Information
Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 2 Inhalation - Eye Dam. 1 - Press. Gas Liquefied gas - Skin Corr. 1A
supp_hazards
存储类别
2A - Gases
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles