grade
electronic grade
assay
≥98.35%
form
gas
reaction suitability
core: boron
impurities
<1 ppm Oxygen (O2), <1.5% Dimethylethylborane [B(CH3)2C2H5], <10 ppm Carbon dioxide (CO2), <10 ppm Nitrogen (N2), <100 ppm Methane (CH4), <1000 ppm Trimethylamine (TMA), <50 ppm Hydrogen (H2)
bp
−20.2 °C (lit.)
mp
−161.5 °C (lit.)
SMILES string
CB(C)C
InChI
1S/C3H9B/c1-4(2)3/h1-3H3
InChI key
WXRGABKACDFXMG-UHFFFAOYSA-N
Application
化学气相沉积 (CVD) 所形成碳化硼薄膜的前体。
三甲基硼可作为硼-碳膜化学气相沉积的有机金属前体,以及硼磷硅玻璃 (BPSG) 沉积的硼源。
Other Notes
建议使用不锈钢调节器 Z527416 或 Z527424。
警示词
Danger
危险代码
Hazard Classifications
Eye Dam. 1 - Press. Gas Liquefied gas - Skin Corr. 1B
存储类别
2A - Gases
WGK
WGK 1
闪点 (F)
Not applicable
闪点 (°C)
Not applicable
PPE(个人防护设备)
Faceshields, Gloves, Goggles, multi-purpose combination respirator cartridge (US)

