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关于此项目
assay
≥99.0% (GC), ≥99.99% (trace metals analysis)
form
liquid
bp
96-99 °C/2-3 mmHg (lit.)
density
0.944 g/mL at 25 °C (lit.)
SMILES string
CCC(C)(C)O[Si](O)(OC(C)(C)CC)OC(C)(C)CC
InChI
1S/C15H34O4Si/c1-10-13(4,5)17-20(16,18-14(6,7)11-2)19-15(8,9)12-3/h16H,10-12H2,1-9H3
InChI key
ORJFXWYTRPGGRK-UHFFFAOYSA-N
General description
Application
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hcodes
Hazard Classifications
Aquatic Chronic 4
存储类别
10 - Combustible liquids
wgk
WGK 3
flash_point_f
222.8 °F - closed cup
flash_point_c
106 °C - closed cup
ppe
Eyeshields, Gloves
法规信息
此项目有
商品
High Purity Metalorganic Precursors for CPV Device Fabrication
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 697303-25G | 04061833607411 |