749044
钛
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis
登录并加购，请在购物车里查看协议价、货期和发货地。
选择规格
变更视图
关于此项目
线性分子式:
Ti
化学文摘社编号:
分子量:
47.87
UNSPSC Code:
12352103
PubChem Substance ID:
EC Number:
231-142-3
MDL number:
assay
99.995% trace metals basis
form
solid
autoignition temp.
860 °F
reaction suitability
core: titanium
resistivity
42.0 μΩ-cm, 20°C
diam. × thickness
3.00 in. × 0.125 in.
bp
3287 °C (lit.)
mp
1660 °C (lit.)
density
4.5 g/mL at 25 °C (lit.)
SMILES string
[Ti]
InChI
1S/Ti
InChI key
RTAQQCXQSZGOHL-UHFFFAOYSA-N
Application
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
存储类别
11 - Combustible Solids
怎么回事？
nwg
闪点 (F)
Not applicable
闪点 (°C)
Not applicable