form
liquid
reaction suitability
core: hafnium
refractive index
n20/D 1.424 (lit.)
bp
90 °C/5 mmHg (lit.)
density
1.166 g/mL at 25 °C (lit.)
SMILES string
CC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C
InChI
1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
InChI key
WZVIPWQGBBCHJP-UHFFFAOYSA-N
Application
Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.
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signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
存储类别
3 - Flammable liquids
wgk
WGK 3
flash_point_f
82.4 °F - closed cup
flash_point_c
28 °C - closed cup
法规信息
新产品
此项目有
Williams, P. A.; et al
Journal of Materials Chemistry, 12, 165-165 (2002)
Dabrian, A.; et al.
Crystal Growth & Design, 11, 203-203 (2011)
Sean W Depner et al.
ACS nano, 8(5), 4678-4688 (2014-04-23)
We demonstrate that the degree of branching of the alkyl (R) chain in a Hf(OR)4 precursor allows for control over the length of HfO2 nanocrystals grown by homocondensation of the metal alkoxide with a metal halide. An extended nonhydrolytic sol-gel
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 760463-10G | 04061833607893 |

