form
liquid
reaction suitability
core: hafnium
refractive index
n
bp
90 °C/5 mmHg (lit.)
density
1.166 g/mL at 25 °C (lit.)
SMILES string
CC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C
InChI
1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
InChI key
WZVIPWQGBBCHJP-UHFFFAOYSA-N
Application
Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.
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signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
存储类别
3 - Flammable liquids
wgk
WGK 3
flash_point_f
82.4 °F - closed cup
flash_point_c
28 °C - closed cup

