774022
氧化钇(III)
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis
别名:
氧化钇
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关于此项目
线性分子式:
Y2O3
化学文摘社编号:
分子量:
225.81
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352302
EC Number:
215-233-5
MDL number:
assay
99.99% trace metals basis
form
powder
reaction suitability
core: yttrium
diam. × thickness
2.00 in. × 0.25 in.
mp
2410 °C (lit.)
density
5.01 g/mL at 25 °C (lit.)
SMILES string
O=[Y]O[Y]=O
InChI
1S/3O.2Y
InChI key
SIWVEOZUMHYXCS-UHFFFAOYSA-N
Application
Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.
存储类别
13 - Non Combustible Solids
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable