蒸汽压
1 mmHg ( 719 °C)
等级
technical
方案
≥85%
表单
lumps
mp
361 °C (lit.)
痕量阴离子
chloride (Cl-): ≤100 mg/kg
sulfate (SO42-): ≤50 mg/kg
痕量阳离子
Fe: ≤20 mg/kg
SMILES字符串
[OH-].[K+]
InChI
1S/K.H2O/h;1H2/q+1;/p-1
InChI key
KWYUFKZDYYNOTN-UHFFFAOYSA-M
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警示用语：
Danger
危险声明
危险分类
Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A
储存分类代码
8A - Combustible corrosive hazardous materials
WGK
WGK 1
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
法规信息
新产品
此项目有
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We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is
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Surface texturing is demonstrated by the combination of wet etching and ultrafast laser nanostructuring of silica glass. Using potassium hydroxide (KOH) at room temperature as an etchant of laser modified glass, we show the polarization dependent linear increase in retardance
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