484431
丙二醇单甲醚乙酸酯
≥99.5%, suitable for synthesis, ReagentPlus®
别名:
DOWANOL® PMA, MPA, PGMEA, 丙二醇一甲醚乙酸酯, 丙二醇甲醚醋酸酯, 乙酸-1-甲氧基-2-丙基酯
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关于此项目
线性分子式:
CH3CO2CH(CH3)CH2OCH3
化学文摘社编号:
分子量:
132.16
NACRES:
NA.21
PubChem Substance ID:
UNSPSC Code:
12352100
EC Number:
203-603-9
MDL number:
Beilstein/REAXYS Number:
1751656
Assay:
≥99.5%
Bp:
145-146 °C (lit.)
145-146 °C
145-146 °C
Vapor pressure:
3.7 mmHg ( 20 °C)
产品名称
丙二醇单甲醚乙酸酯, ReagentPlus®, ≥99.5%
InChI key
LLHKCFNBLRBOGN-UHFFFAOYSA-N
InChI
1S/C6H12O3/c1-5(4-8-3)9-6(2)7/h5H,4H2,1-3H3
SMILES string
COCC(C)OC(C)=O
vapor pressure
3.7 mmHg ( 20 °C)
product line
ReagentPlus®
assay
≥99.5%
autoignition temp.
669 °F
expl. lim.
13.1 %
dilution
(for general lab use)
refractive index
n20/D 1.402 (lit.)
bp
145-146 °C (lit.)
145-146 °C
solubility
water: soluble 198 g/L at 20 °C
density
0.970 g/mL at 25 °C (lit.)
functional group
ester
ether
Quality Level
Gene Information
human ... AR(367), IMPDH2(3615), NR3C1(2908), PGR(5241)
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Application
丙二醇单乙醚乙酸酯用于研究开发流控通道，并将其并入基于聚二甲基硅氧烷(PDMS)的微流控装置中。
General description
醋酸丙二醇单甲基醚(PGMEA)是一种光阻材料溶剂。已有研究关于不同土壤类型微生物对其的降解作用。吸入研究结果已经获得了口服参考剂量(RfD)的PGMEA值。(5-烷基磺酰亚胺-5H-噻吩-2-吡啶)-2-甲基苯基乙腈在PGMEA中的溶解度已被分析。
Legal Information
Dow Chemical产品
ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany
DOWANOL is a registered trademark of The Dow Chemical Company or an affiliated company of Dow
signalword
Warning
hcodes
Hazard Classifications
Flam. Liq. 3
存储类别
3 - Flammable liquids
wgk
WGK 2
flash_point_f
113.9 °F - closed cup
flash_point_c
45.5 °C - closed cup
法规信息
危险化学品
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Christian Bleilevens et al.
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Asakura T, et al.
SPIE Proc., 4345 (2001)
Comparison of photoresist shelf life in PGMEA and CA solvent systems.
Nelson WC.
SPIE Proc., 2195 (1994)
Yug C Saraswat et al.
Journal of colloid and interface science, 564, 43-51 (2020-01-07)
Our ability to dictate the colloid geometry is intimately related to self-assembly. The synthesis of anisotropic colloidal particles is currently dominated by wet chemistry and lithographic techniques. The wet chemical synthesis offers limited particle geometries at bulk quantities. Lithographic techniques
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