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Application of the Fenton process in the elimination of helminth eggs.

Application of the Fenton process in the elimination of helminth eggs.

Journal of water and health (2014-12-05)

Sandra Isabel Escobar-Megchún, Hugo Alejandro Nájera-Aguilar, Magaly González-Hilerio, Javier Gutiérrez-Jiménez, Rubén Fernando Gutiérrez-Hernández, María Neftalí Rojas-Valencia

摘要

This study relates to a method for evaluating the degradation efficiency of Ascaris lumbricoides eggs through a Fenton reaction, using hydrogen peroxide (H2O2) at 100, 250, and 500 mg/L, ferrous sulfate (FeSO4) at 458 mg/L Fe(2+) and pH values of 3, 4.5, and 6. The experiments were conducted according to a 3(2) experimental design, with 1:1, 3:1, and 5:1 (H2O2/Fe(2+)) molar ratios. The oxidation and flocculation stages were performed at 130 rpm during 2 hours and at 25-30 rpm during 20 min, respectively. As a result of the Fenton reaction, an average of 91.2% Ascaris lumbricoides egg degradation was achieved at pH 6 using a 500 mg/L dose of H2O2 and a 3:1 (H2O2/Fe(2+)) molar ratio. Thus, this process is an alternative for eliminating parasites that are resistant to conventional disinfection processes and significantly reduces the human health hazard they represent.

材料

Product Number

品牌

产品描述

Sigma-Aldrich

硫酸铁(II) 七水合物, ReagentPlus^®, ≥99%

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硫酸铁(II) 七水合物, ACS reagent, ≥99.0%

Sigma-Aldrich

铁, ≥99%, reduced, powder (fine)

Millipore

过氧化氢溶液, 3%, suitable for microbiology

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硫酸铁(II) 七水合物, BioReagent, suitable for cell culture, suitable for insect cell culture, ≥99%

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过氧化氢溶液, contains ~200 ppm acetanilide as stabilizer, 3 wt. % in H₂O

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硫酸铁(II) 七水合物, puriss., meets analytical specification of Ph. Eur., BP, USP, FCC, 99.5-104.5% (manganometric)

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过氧化氢溶液, contains inhibitor, 35 wt. % in H₂O

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铁, granular, 10-40 mesh, >99.99% trace metals basis

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羰基铁, ≥97% Fe basis

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过氧化氢溶液, 34.5-36.5%

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铁, puriss. p.a., carbonyl-Iron powder, low in magnesium and manganese compounds, ≥99.5% (RT)

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硫酸铁(II) 七水合物, suitable for plant cell culture, ≥99%

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铁, powder, −325 mesh, 97%

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铁, chips, 99.98% trace metals basis

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铁, foil, thickness 0.1 mm, ≥99.9% trace metals basis

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铁, wire, diam. 1.0 mm, ≥99.9% trace metals basis

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铁, foil, thickness 0.25 mm, ≥99.99% trace metals basis

铁, foil, 100x100mm, thickness 0.25mm, hard, 99.5%

铁, foil, 100x100mm, thickness 0.1mm, hard, 99.5%

铁, IRMM^®, certified reference material, 0.5 mm wire

铁, foil, 300x300mm, thickness 0.1mm, hard, 99.5%

铁, rod, 100mm, diameter 2.0mm, as drawn, 99.95%

铁, rod, 50mm, diameter 40mm, as drawn, armcO« soft ingot 99.8%

铁, rod, 200mm, diameter 6.35mm, as drawn, soft ingot 99.8%

铁, rod, 200mm, diameter 25mm, as drawn, 98+%

铁, tube, 200mm, outside diameter 3.2mm, inside diameter 2.2mm, wall thickness 0.5mm, as drawn, 99.8%

铁, rod, 100mm, diameter 100mm, as drawn, armcO« soft ingot 99.8%

铁, foil, 150x150mm, thickness 1.5mm, as rolled, 99.5%

铁, rod, 200mm, diameter 9.5mm, as drawn, soft ingot 99.8+%