317004
氟化钽(V)
98%
别名:
Tantalum pentafluoride
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关于此项目
线性分子式:
TaF5
化学文摘社编号:
分子量:
275.94
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352302
EC Number:
232-022-3
MDL number:
Assay:
98%
Form:
powder
InChI key
YRGLXIVYESZPLQ-UHFFFAOYSA-I
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
SMILES string
F[Ta](F)(F)(F)F
assay
98%
form
powder
reaction suitability
core: tantalum, reagent type: catalyst
density
4.74 g/mL at 25 °C (lit.)
Quality Level
General description
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
Application
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1B
存储类别
8B - Non-combustible corrosive hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
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