Quality Segment
assay
98%
form
powder
reaction suitability
core: tantalum, reagent type: catalyst
density
4.74 g/mL at 25 °C (lit.)
SMILES string
F[Ta](F)(F)(F)F
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
InChI key
YRGLXIVYESZPLQ-UHFFFAOYSA-I
General description
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
Application
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1B
存储类别
8B - Non-combustible corrosive hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges