氟化钽(V)

Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.

Tantalum(V) fluoride can be used:

• As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
• As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
• To enhance the photocurrent stability and photoluminescence of WO₃ films (used as photoelectrode for photolysis of water).
• As a catalyst for N-alkylation of arylamines with benzylalcohols.