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Merck
CN

651796

Sigma-Aldrich

负性光致抗蚀剂 I

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化学文摘社编号:
9003-31-0
MDL编号:
MFCD00084438
UNSPSC代码:
41116107
NACRES:
NA.23

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分子量

average Mw 60,000-70,000 (polyisoprene)

质量水平

100

组成

solids, 27-29 wt. %

介电常数

2.4

表面张力

29.2 dyn/cm

粘度

465-535 cP(25 °C)

沸点

122-142 °C (lit.)

密度

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

储存温度

2-8°C

SMILES字符串

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

相关类别

一般描述

作为负性光致抗蚀剂套装 654892 的一部分提供
经稳定、纯化的光致抗蚀剂，表现出出色的分辨率、粘附性、抗蚀刻性以及低针孔密度。

警示用语：

Danger

危险分类

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

靶器官

Respiratory system

储存分类代码

3 - Flammable liquids

WGK

WGK 3

闪点(°F)

75.2 °F - closed cup

闪点(°C)

24 °C - closed cup

个人防护装备

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

法规信息

新产品
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历史批次信息供参考:

分析证书(COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. At what wavelength does Product 651796, Negative photoresist, have absorbance?

    This product has a spectral absorbance range of 310-480nm. The peak spectral sensitivity is around 355nm.

  4. How should Product 651796, Negative photoresist, be stored?

    It should be refrigerated to inhibit polymerization and warmed to room temperature before opening.  It should also be stored away from light sources and kept in the sealed bottle.

  5. How do I use Product 651796, Negative photoresist?

    Please refer to technical bulletin AL-217 for detailed procedures.

  6. When using Product 651796, Negative photoresist, how do I remove the photoresist film?  

    Hot chlorinated hydrocarbons such as those in Product No. 651761, Negative Resist Remover I, swell the photoresist, which effectively removes the resist film.  The ideal temperature at which to use the remover is 50-60°C.

  7. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  8. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  9. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Shinya Takeno et al.
Bioscience, biotechnology, and biochemistry, 74(1), 13-17 (2010-01-09)
Natural polyisoprene is a biopolymer consisting of isoprene units (C(5)H(8)) that is used commercially in household, medical, and industrial materials. For the management of natural polyisoprene production, the selection of high-yield polyisoprene-producing trees, and an understanding of polyisoprene biosynthesis, a
Christopher J Ellison et al.
The journal of physical chemistry. B, 113(12), 3726-3737 (2009-08-13)
Polymeric bicontinuous microemulsions are thermodynamically stable structures typically formed by ternary blends of immiscible A and B homopolymers and a macromolecular surfactant such as an AB diblock copolymer. Investigations of these bicontinuous morphologies have largely focused on model systems in
Carina Schulte et al.
Applied and environmental microbiology, 74(24), 7643-7653 (2008-10-28)
Gordonia westfalica Kb1 and Gordonia polyisoprenivorans VH2 induce the formation of an extracellular superoxide dismutase (SOD) during poly(cis-1,4-isoprene) degradation. To investigate the function of this enzyme in G. polyisoprenivorans VH2, the sodA gene was disrupted. The mutants exhibited reduced growth
Maren Krack et al.
Journal of the American Chemical Society, 130(23), 7315-7320 (2008-05-20)
Magnetic nanoparticles have been assembled into the bilayer membrane of block copolymer vesicles. The nanoparticles decorate the hydrophobic/hydrophilic interface, which leads to bridging of adjacent bilayers and the formation of oligo-lamellar vesicles. The nanoparticle uptake of the vesicles is sufficiently
Chandy Kim et al.
Journal of chromatography. A, 1213(2), 181-188 (2008-11-11)
Natural and synthetic poly(cis-1,4-isoprene) were characterized by size-exclusion chromatography coupled with an online multi-angle light scattering detector (SEC-MALS). Unlike synthetic poly(cis-1,4-isoprene) (SR), natural rubber (NR) samples showed anomalous elution profiles. The beginning of elution was very similar to SR but
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实验方案

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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