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安全信息

651796

Sigma-Aldrich

负性光致抗蚀剂 I

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CAS号:
9003-31-0
MDL编号:
MFCD00084438
NACRES:
NA.23

分子量

average Mw 60,000-70,000 (polyisoprene)

质量水平

100

组成

solids, 27-29 wt. %

介电常数

2.4

表面张力

29.2 dyn/cm

粘度

465-535 cP(25 °C)

bp

122-142 °C (lit.)

密度

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

储存温度

2-8°C

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

相关类别

一般描述

作为负性光致抗蚀剂套装 654892 的一部分提供
经稳定、纯化的光致抗蚀剂，表现出出色的分辨率、粘附性、抗蚀刻性以及低针孔密度。

警示用语：

Danger

危险分类

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

靶器官

Respiratory system

储存分类代码

3 - Flammable liquids

WGK

WGK 3

闪点(°F)

75.2 °F - closed cup

闪点(°C)

24 °C - closed cup

个人防护装备

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

法规信息

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. At what wavelength does Product 651796, Negative photoresist, have absorbance?

    This product has a spectral absorbance range of 310-480nm. The peak spectral sensitivity is around 355nm.

  4. How should Product 651796, Negative photoresist, be stored?

    It should be refrigerated to inhibit polymerization and warmed to room temperature before opening.  It should also be stored away from light sources and kept in the sealed bottle.

  5. How do I use Product 651796, Negative photoresist?

    Please refer to technical bulletin AL-217 for detailed procedures.

  6. When using Product 651796, Negative photoresist, how do I remove the photoresist film?  

    Hot chlorinated hydrocarbons such as those in Product No. 651761, Negative Resist Remover I, swell the photoresist, which effectively removes the resist film.  The ideal temperature at which to use the remover is 50-60°C.

  7. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  8. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  9. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Gérald Guérin et al.
Journal of the American Chemical Society, 130(44), 14763-14771 (2008-10-14)
In alkane solvents, poly(isoprene-b-ferrocenyldimethylsilane) (PI-b-PFS) block copolymer forms fiberlike micelles, which show intriguing similarities with biological fibers such as amyloid fibers. Both systems exhibit fiber growth by a nucleated self-assembly mechanism and rapidly fragment upon exposure to the shear forces
S M Al-Salem et al.
Journal of hazardous materials, 172(2-3), 1690-1694 (2009-08-29)
Thermo-chemical treatments (mainly pyrolysis) directed towards energy and products recovery provide a very promising alternative to open space disposal or landfilling, reducing in the process hazardous waste and potential contamination to soil and water resources. In this communication, we present
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
Thomas Schmidt et al.
BMC biochemistry, 11, 11-11 (2010-02-23)
Natural rubber is a biopolymer with exceptional qualities that cannot be completely replaced using synthetic alternatives. Although several key enzymes in the rubber biosynthetic pathway have been isolated, mainly from plants such as Hevea brasiliensis, Ficus spec. and the desert
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实验方案

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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