vapor density
1.3 (vs air)
Quality Level
Application
通过将具有纳米材料的基板浸入蚀刻剂溶液中30分钟，CE-200溶液可用于从化学气相沉积（CVD）石墨烯或碳酸膜中蚀刻出铜残留物或箔。
它是铜喷涂蚀刻的理想选择。氯化铁基铜蚀刻剂，在40°C下的蚀刻速率为0.5 mil/min。
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1
存储类别
8B - Non-combustible corrosive hazardous materials
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
The effect of copper pre-cleaning on graphene synthesis
Kim SM, et al.
Nanotechnology, 24(36), 365602-365602 (2013)
Copper etching with cupric chloride and regeneration of waste etchant
Cakir O
Journal of Materials Processing Technology, 175(1-3), 63-68 (2006)
Microbial colonisation of transparent glass-like carbon films triggered by a reversible radiation-induced hydrophobic to hydrophilic transition
Jalvo B, et al.
Royal Society of Chemistry Advances, 6(55), 50278-50287 (2016)
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 667528-500ML | 04061832734637 |