Merck
CN

668729

Sigma-Aldrich

二乙基锌

packaged for use in deposition systems

登录查看公司和协议定价

别名:
DEZ, Zincdiethyl
线性分子式:
(C2H5)2Zn
CAS号:
分子量:
123.51
Beilstein:
3587207
EC 号:
MDL编号:
PubChem化学物质编号:
NACRES:
NA.23

质量水平

形式

liquid

折射率

n20/D 1.498 (lit.)

bp

117 °C (lit.)

mp

−28 °C (lit.)

密度

1.205 g/mL at 25 °C (lit.)

SMILES string

CC[Zn]CC

InChI

1S/2C2H5.Zn/c2*1-2;/h2*1H2,2H3;

InChI key

HQWPLXHWEZZGKY-UHFFFAOYSA-N

正在寻找类似产品? Visit 产品对比指南

一般描述

Atomic number of base material: 30 Zinc

应用

Reacted with water in a low temperature (<200°C) atomic layer deposition of polycrystalline ZnO layers displaying exciton photoluminescence at room temperature.

警示用语:

Danger

危险分类

Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

补充剂危害

储存分类代码

4.2 - Pyrophoric and self-heating hazardous materials

WGK

WGK 3

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

法规信息

监管及禁止进口产品

分析证书(COA)

输入产品批号来搜索 分析证书(COA) 。批号可以在产品标签上"批“ (Lot或Batch)字后找到。

已有该产品?

为方便起见,与您过往购买产品相关的文件已保存在文档库中。

访问文档库

难以找到您所需的产品或批次号码?

在网站页面上,产品编号会附带包装尺寸/数量一起显示(例如:T1503-25G)。请确保 在“产品编号”字段中仅输入产品编号 (示例: T1503).

示例

T1503
货号
-
25G
包装规格/数量

其它示例:

705578-5MG-PW

PL860-CGA/SHF-1EA

MMYOMAG-74K-13

1000309185

输入内容 1.000309185)

遇到问题?欢迎随时联系我们技术服务 寻求帮助

批号可以在产品标签上"批“ (Lot或Batch)字后面找到。

Aldrich 产品

  • 如果您查询到的批号为 TO09019TO 等,请输入去除前两位字母的批号:09019TO。

  • 如果您查询到的批号含有填充代码(例如05427ES-021),请输入去除填充代码-021的批号:05427ES。

  • 如果您查询到的批号含有填充代码(例如 STBB0728K9),请输入去除填充代码K9的批号:STBB0728。

未找到您寻找的产品?

部分情况下,可能未在线提供COA。如果搜索不到COA,可在线索取。

索取COA

  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  4. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  5. Can the empty deposition cylinders be refilled?

    Yes, we are able to refill these cylinders through our SAFC Hitech group.  Please contact our Technical Service department by email at techserv@sial.com, and they will forward you to the appropriate SAFC Hitech representative for a quote.

  6. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Journal of Applied Physics, 103, 033515-033515 (2008)
Sang-Jin Jeon et al.
Journal of the American Chemical Society, 127(47), 16416-16425 (2005-11-25)
There is a great demand for development of catalyst systems that are not only efficient and highly enantioselective but are also environmentally benign. Herein we report investigations into the catalytic asymmetric addition of alkyl and functionalized alkyl groups to ketones
Donna K Friel et al.
Journal of the American Chemical Society, 130(30), 9942-9951 (2008-07-01)
Alkylations of pyridyl-substituted ynones with Et2Zn and Me2Zn, promoted by amino acid-based chiral ligands in the presence of Al-based alkoxides, afford tertiary propargyl alcohols efficiently in 57% to >98% ee. Two easily accessible chiral ligands are identified as optimal for
Lianbing Zhang et al.
Angewandte Chemie (International ed. in English), 48(27), 4982-4985 (2009-06-06)
New uses for ALD: By applying standard metal oxide atomic layer deposition (ALD) to two types of porphyrins, site-specific chemical infiltration of substrate molecules is achieved: Diethylzinc can diffuse into the interior of porphyrin supramolecular structures and induce metalation of
Masahiro Ueno et al.
Chemical communications (Cambridge, England), (33)(33), 3549-3550 (2006-08-22)
The use of catalytic t-Bu-P4 base dramatically improved the performance of halogen-zinc exchange of aryl iodides, and the arylzinc derivatives were functionalized under copper-free reaction conditions.

商品

Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.

近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。

igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.

Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.

查看所有结果

我们的科学家团队拥有各种研究领域经验,包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.

联系技术服务部门