General description
BOE 6:1是6份体积的40%氟化铵和1份体积的49%氢氟酸。
缓冲氧化物蚀刻剂（BOE）是一种用于微细加工的液体腐蚀剂。它的主要用途是蚀刻二氧化硅（SiO2）或氮化硅（Si3N4）的薄膜。它是氟化铵（NH4F）和氢氟酸（HF）等缓冲液的混合物。浓缩的 HF 蚀刻二氧化硅的速度太快，不能很好地进行工艺控制，同时也会剥落用于光刻图案化的光刻胶。
Application
缓冲氧化物蚀刻剂（BOE）6：1可用于栅极光刻（gate photolithography）的AlGaN / GaN基高电子迁移率晶体管的氧化物去除。它可用于缓冲氧化物蚀刻剂法，制造微型生物芯片。
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Danger
hcodes
Hazard Classifications
Acute Tox. 1 Dermal - Acute Tox. 2 Oral - Acute Tox. 3 Inhalation - Eye Dam. 1 - Skin Corr. 1A
存储类别
6.1B - Non-combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
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WGK 2
Effect of passivation on AlGaN/GaN HEMT device performance
2000 IEEE international symposium on compound semiconductors, 357-363 (2000)
Fabrication of a new micro bio chip and flow cell cytometry system using Bio-MEMS technology
Byun I, et al.
Microelectronics Journal, 39(5), 717-722 (2008)
Surface cleaning and preparation in AlGaN/GaN-based HEMT processing as assessed by X-ray photoelectron spectroscopy
Gonzalez-Posada F, et al.
Applied Surface Science, 253(14), 6185-6190 (2007)
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 901624-4L | 04065269267560 |
| 901624-1L | 04061836816025 |