Merck
CN
  • Unraveling the Issue of Ag Migration in Printable Source/Drain Electrodes Compatible with Versatile Solution-Processed Oxide Semiconductors for Printed Thin-Film Transistor Applications.

Unraveling the Issue of Ag Migration in Printable Source/Drain Electrodes Compatible with Versatile Solution-Processed Oxide Semiconductors for Printed Thin-Film Transistor Applications.

ACS applied materials & interfaces (2017-04-08)
Gyu Ri Hong, Sun Sook Lee, Hye Jin Park, Yejin Jo, Ju Young Kim, Hoi Sung Lee, Yun Chan Kang, Beyong-Hwan Ryu, Aeran Song, Kwun-Bum Chung, Youngmin Choi, Sunho Jeong
摘要

In recent decades, solution-processable, printable oxide thin-film transistors have garnered a tremendous amount of attention given their potential for use in low-cost, large-area electronics. However, printable metallic source/drain electrodes undergo undesirable electrical/thermal migration at an interfacial stack of the oxide semiconductor and metal electrode. In this study, we report oleic acid-capped Ag nanoparticles that effectively suppress the significant Ag migration and facilitate high field-effect mobilities in oxide transistors. The origin of the role of surface-capped Ag nanoparticles is clarified with comparative studies based on X-ray photoelectron spectroscopy and X-ray absorption spectroscopy.

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Sigma-Aldrich
油酸, technical grade, 90%
Sigma-Aldrich
2-甲氧基乙醇, anhydrous, 99.8%
Sigma-Aldrich
辛胺, 99%
Sigma-Aldrich
苯肼, 97%
Sigma-Aldrich
PTCDA, 97%
Sigma-Aldrich
1,3-二氯苯, puriss., ≥99.0% (GC)